58442B 3 31150 0 286.50 290.65 NIST I PCE 19 12 1 S RT APHYRIC BASALT; 2 S TEX INTERGRANULAR-INTERSERTAL, APHYRIC; 3 S WS FLOW INTERIOR* 4 G PLAG 30 0.1-3.0SUBHEDRAL 5 G % APPROX COMP AN65; 6 G CPX 18 0.1-0.5EUHEDRAL 7 G GLASS 20 8 A CARB 1VESICLES 9 A CLAY.MIN 1VESICLES 10 V 0.05-0.1 30 CARB,CLAY.MIN ROUND, 11 V IRREGULAR 12 58442B 3 4 540 560 286.50 291.55 NIST I PCE 5A 15 1 S RT PLAG SPARSELY PHYRIC BASALT; 2 S TEX INTERSERTAL, SPARSELY PORPHYRITIC; 3 S WS FLOW INTERIOR* 4 P PLAG <1 0.4-1.5EUHEDRAL 5 G PLAG 30 0.05-1.0SUBHEDRAL 6 G % APPROX COMP AN60; 7 G CPX 20 0.03-0.1ANHEDRAL 8 G % AUGITE COMP; 9 G COMBINE 20 10 G % INCLUDES GLASS+MAGN,IK UNCERTAIN FOR MAGN* 11 A CARB 1VESICLES 12 A CLAY.MIN 1VESICLES 13 V 25 CARB,CLAY.MINS ROUND, 14 V IRREGULAR 15 58442B 4 111701190 296.00 297.18 NIST I PCE 19 12 1 S RT APHYRIC BASALT; 2 S TEX INTERSERTAL, APHYRIC; 3 S WS FLOW INTERIOR* 4 G PLAG 30 0.1-0.5SUBHEDRAL 5 G % APPROX COMP AN60; 6 G CPX 20 0.03-0.1ANHEDRAL 7 G % AUGITE COMP; 8 G GLASS 20 9 G % POSSIBILITY OF INTERSTITIAL MAGN* 10 A CARB 1VESICLES 11 V 0.01-0.1 28 CARB 12 58442B 8 4 30 50 334.00 338.54 NIST I PCE 1A 18 1 S RT PLAG-CPX PHYRIC BASALT; 2 S TEX INTERSERTAL,OPHITIC, PORPHYRITIC 3 S % PARTLY OPHITIC; 4 S WS FLOW INTERIOR* 5 P PLAG 27 1-5EUHEDRAL,SUBHEDRAL 6 P % APPROX COMP AN70,PARTLY SKELETAL; 7 P CPX 20 1-5ANHEDRAL 8 P % AUGITE COMP* 9 G MAGN 1-2 0.7-1SKELETAL,ISOMETRICAL 10 G % MAINLY IN GROUNDMASS; 11 G GLASS 50 12 A CARB TRVESICLES 13 A COMBINE 50VESICLES, 14 A GROUNDMASS 15 A % INCLUDES ZEOLITES+CHLORITE* 16 V 0.1-0.5 1-2 CARB,ZEOLITES, ROUND 17 V CHLORITE 18 58442B 8 6 840 0 334.00 342.34 NIST I PCE 3 15 1 S RT APHYRIC BASALT; 2 S TEX APHYRIC,SUBOPHITIC; 3 S WS FLOW INTERIOR* 4 G PLAG 40 0.5-5EUHEDRAL,SUBHEDRAL 5 G % APPROX COMP AN60; 6 G CPX 25 1-4ANHEDRAL 7 G % AUGITIC COMPOSITION; 8 G MAGN 1 0.1-0.6 9 A COMBINE 30GROUNDMASS, GROUNDMASS 10 A VESICLES 11 A % INCLUDES CHLORITE+ZEOLITES,CHLORITE REPLACING 12 A % GROUNDMASS* 13 V 0.7-6.0 5 ZEOL,CHLORITE ROUND 14 V % CHLORITE AND ZEOLITES ON WALLS AND RIMS* 15 58442B 8 710701090 334.00 344.08 NIST I PCE 12A 14 1 S RT APHYRIC BASALT; 2 S TEX OPHITIC, APHYRIC; 3 S WS FLOW INTERIOR* 4 G PLAG 45 1-4SUBHEDRAL,SKELETAL 5 G % APPROX COMP AN60; 6 G CPX 35 1-3ANHEDRAL 7 G % AUGITE COMP,EXTINCTION ANGLE = 50; 8 G MAGN 1 0.1-0.5SKELETAL,RECTANGULAR 9 A COMBINE 10VESICLES, GROUNDMASS 10 A GROUNDMASS 11 A % INCLUDES ZEOL+CHLOR,PARTLY COLORED BY FE.HYDRRX* 12 V 1-3 10 ZEOLITES, ROUND 13 V CHLORITE 14 58442B 9 1 240 260 343.50 343.75 NIST I PCE 4 13 1 S RT PLAG-CPX PHYRIC BASALT; 2 S TEX GLOMEROPHYRIC,SUBOPHITIC,INTERSERTAL, 3 S PORPHYRITIC; 4 S WS UPPER PART OF FLOW* 5 P PLAG 50 0.3-3SUBHEDRAL 6 P % OCCASIONAL LIGHT ZONATION,APPROX COMP AN58; 7 P CPX 20 0.5-2EUHEDRAL 8 P % AUGITE COMP, 2V 50* 9 A COMBINE 25GROUNDMASS GROUNDMASS,VESICLES 10 A % INCLUDES CLAY.MIN+CHLORITE+ZEOLITES* 11 V 0.1-1.5 3 CLAYS,ZEOLITES, 12 V CHLORITE 13 58442B 9 110301050 343.50 344.54 NIST I PCE 6D 15 1 S RT APHYRIC BASALT; 2 S TEX INTERSERTAL, APHYRIC; 3 S WS FLOW INTERIOR* 4 G PLAG 20 0.2-1SUBHEDRAL,ACICULAR 5 G % APPROX COMP AN60; 6 G CPX 25 0.2-3ANHEDRAL 7 G % AUGITE COMP; 8 G MAGN <1 0.04-0.08 9 G COMBINE 50 MICROLITIC 10 G % INCLUDES GLASS+PLAG+PYX+MAGN* 11 A CARB 3VESICLES 12 A CLAY.MIN 2VESICLES 13 V 0.2-1.0 5 CARBS,CLAY.MINS 14 V % PARTLY FILLED* 15 58442B 9 2 730 750 343.50 345.74 NIST I PCE 7 9 1 S RT PLAG MOD PHYRIC BASALT; 2 S TEX INTERSERTAL, MODERATELY PORPHYRITIC; 3 S WS FLOW INTERIOR* 4 P PLAG 10 0.4-1NEEDLES 5 P % APPROX COMP AN60(?)* 6 G COMBINE 50 MICROLITIC 7 G % INCLUDES GLASS+PLAG+PYX* 8 V 0.1-1.0 40 NONE ROUND 9 58442B 9 3 320 340 343.50 346.83 NIST I PCE 1C 15 1 S RT APHYRIC BASALT; 2 S TEX SUBOPHITIC-INTERSERTAL, APHYRIC; 3 S WS FLOW INTERIOR* 4 G PLAG 30 0.5-2NEEDLES,LATHS 5 G % PARTLY NEEDLES,APPROX COMP AN68; 6 G CPX 20 0.2-1.5SUBHEDRAL,EUHEDRAL 7 G % AUGITE COMP; 8 G COMBINE 45 MICROLITIC 9 G % INCLUDES GLASS+PLAG+PYX+MAGN, MICROLITES OF 10 G % PLAG+PYX+MAGN* 11 A CARB 1 VESICLES 12 A % 0.2-1.5MM IN SIZE* 13 V 0.2-2.0 3 CALCITE 14 V % PARTLY FILLED BY CALCITE* 15 58442B 10 1 930 950 353.00 353.94 MRSH I PCE 17 9 1 S RT APHYRIC BASALT; 2 S TEX GLASSY, APHYRIC; 3 S WS GLASSY MARGIN* 4 G PLAG 10 0.02-0.2LATHS,ACICULAR 5 G % MICROLITES; 6 G GLASS 70 7 G MICROXLN 20 8 G % CRYPTOCRYSTALLINE MATERIAL* 9 58442B 10 1 931 951 353.00 353.94 MRSH I PCE 17 10 1 S RT PLAG SPARSELY PHYRIC BASALT; 2 S TEX SPARSELY PORPHYRITIC; 3 S WS NEXT TO GLASSY MARGIN* 4 P PLAG 0.5 0.2-1LATHS 5 P % APPROX COMP AN58* 6 G MICROXLN 68.5 7 G % CRYPTOCRYSTALLINE MATRIX* 8 A CLAY.MIN 1VESICLES 9 V 0.02-1 20 CLAY.MINS 10 58442B 11 1 600 620 362.50 363.11 MRSH I PCE 10A 13 1 S RT APHYRIC BASALT; 2 S TEX INTERSERTAL, APHYRIC; 3 S WS FLOW INTERIOR* 4 P SPINEL 0.1 5 P % 1 PIECE,ROUNDED TRIANGLE,RED-BROWN* 6 G PLAG 20 0.2-1ACICULAR 7 G % SOME WITH PLUMOSE TEXTURE(PYX FEATHERS); 8 G MICROXLN 39 9 G % CRYPTOCRYSTALLINE MATRIX* 10 A CLAY.MIN 1LINE FRACTUREMICROXLN 11 A % CLAY LINES FRACTURE AND REPLACES MICROXLN* 12 V 0.1-0.5 40 13 58442B 11 212701290 362.50 365.28 MRSH I PCE 16 10 1 S RT APHYRIC BASALT; 2 S TEX INTERSERTAL, APHYRIC; 3 S WS FLOW INTERIOR* 4 G PLAG 25 0.02-1LATHS 5 G % ELONGATED LATHS,APPROX COMP AN62; 6 G CPX 10 0.02-0.5ACICULAR 7 G MAGN 2 <0.02GRANULAR 8 G MICROXLN 28 9 V 0.05-0.5 35 ROUNDED 10 58442B 11 3 180 200 362.50 365.69 MRSH I PCE 3 13 1 S RT PLAG SPARSELY PHYRIC BASALT; 2 S TEX SPARSELY PORPHYRITIC; 3 S WS PILLOW INTERIOR* 4 P PLAG 1 0.3-1.2EUHEDRAL,LATHS 5 G PLAG 30 0.2-0.5ACICULAR LATHS 6 G % MICROLITES,APPROX COMP AN69; 7 G MAGN 0.5 0.01-0.02GRANULAR 8 G MICROXLN 9 G % CRYPTOCRYSTALLINE MATRIX* 10 A CLAY.MIN 1VESICLES 11 A % LINING VESICLES* 12 V 0.02-1.0 35 CLAY.MIN 13 58442B 13 1 600 630 381.50 382.12 MRSH I PCE 9 11 1 S RT APHYRIC BASALT; 2 S TEX INTERSERTAL, APHYRIC; 3 S WS PILLOW INTERIOR* 4 G PLAG 25 0.2-1LATHS 5 G % APPROX COMP AN59; 6 G CPX 25 0.1-0.5ANHEDRAL 7 G MAGN 0.1 <0.02GRANULAR 8 G MICROXLN 34.5 9 G % CRYPTOCRYSTALLINE MATRIX* 10 V 0.2-0.5 15 11 58442B 13 3 20 40 381.50 384.53 MRSH I PCE 1 12 1 S RT APHYRIC BASALT; 2 S TEX INTERSERTAL, APHYRIC; 3 S WS PILLOW INTERIOR* 4 G PLAG 33 0.1-1ACICULAR,MICROLITES 5 G % APPROX COMP AN60; 6 G MAGN TR 7 G % VERY FINE GRAINED; 8 G MICROXLN 33 9 G % CRYPTOCRYSTALLINE MATRIX* 10 A CLAY.MIN 1 MICROXLN 11 V 0.1-0.4 33 12 58442B 14 2 340 360 391.00 392.85 MRSH I PCE 5 20 1 S RT APHYRIC BASALT; 2 S TEX INTERSERTAL, APHYRIC; 3 S WS PILLOW INTERIOR* 4 P PLAG LATH 5 P % ONLY ONE,0.5X0.2MM; 6 P SPINEL <0.02EUHEDRAL 7 P % ODD GRAINS IN PYX* 8 G PLAG 20 0.1-0.5LATHS 9 G % ACICULAR OR ELONGATED LATHS,APPROX COMP AN59; 10 G CPX 10 0.1-0.3ANHEDRAL 11 G % POORLY DEVELOPED; 12 G MAGN <0.01 13 G % DISSEMINATED IN ODD AREAS; 14 G MICROXLN 20 15 G % CRYPTOCRYSTALLINE MATRIX; 16 G COMBINE 20 17 G % INCLUDES GLASS+PLAG, GLASSY SPHERES WITH PLAG 18 G % MICROLITES* 19 V 0.02-0.5 30 20 58442B 15 1 680 700 400.50 401.19 MRSH I PCE 11 10 1 S RT APHYRIC BASALT; 2 S TEX INTERSERTAL, APHYRIC; 3 S WS PILLOW INTERIOR* 4 G PLAG 20 0.05-0.5LATHS 5 G % ACICULAR OR ELONGATED LATHS,APPROX COMP AN55; 6 G CPX 15 0.05-0.4 7 G MAGN TR <0.02 8 G MICROXLN 30 9 V 0.1-1.5 35 10 58442B 18 1 30 50 426.50 426.54 MRSH I PCE 2 15 1 S RT PLAG-CPX SPARSELY PHYRIC BASALT; 2 S TEX INTERSERTAL, SPARSELY PORPHYRITIC; 3 S WS PILLOW INTERIOR* 4 P PLAG 0.5X0.2LATHS 5 P % ZONED; 6 P CPX 0.2X0.3SUBHEDRAL 7 P % HOUR GLASS ZONED* 8 G PLAG 25 0.1-1LATHS 9 G % ACICULAR OR ELONGATED LATHS; 10 G CPX 25 0.01-0.1ANHEDRAL 11 G % MAINLY FINELY CRYSTALLINE; 12 G MAGN 0.5 0.01GRANULAR 13 G MICROXLN 9.5 14 G % CRYPTOCRYSTALLINE MATRIX* 15 58442B 19 1 430 450 436.00 436.44 NIST I PCE 6 16 1 S RT APHYRIC BASALT; 2 S TEX INTERGRANULAR-INTERSERTAL, APHYRIC; 3 S WS PILLOW INTERIOR 4 S % TOP OF LAVA FLOW* 5 G PLAG 25 0.2-1.5EUHEDRAL,SUBHEDRAL 6 G % APPROX COMP AN 64; 7 G CPX 30 0.03-0.5EUHEDRAL 8 G % AUGITE COMP; 9 G COMBINE 20 10 G % INCLUDES GLASS+MAGN IN GROUNDMASS AND AROUND 11 G % VESICLES* 12 A ZEOLITES RARE 13 A % VERY FEW* 14 V 0.1-2.0 25 ROUND, 15 V IRREGULAR 16 58442B 19 2 620 640 436.00 438.13 NIST I PCE 9 12 1 S RT PLAG-CPX MOD PHYRIC BASALT; 2 S TEX VARIOLITIC, MODERATELY PORPHYRITIC; 3 S WS GLASSY MARGIN* 4 P PLAG 3 0.7-0.1EUHEDRAL 5 P % APPROX COMP AN60; 6 P CPX 1 0.1-0.5SUBHEDRAL 7 P % AUGITE COMP* 8 G PLAG MICROLITES 9 G CPX MICROLITES 10 V 0-1.5 30 NONE ROUND, 11 V IRREGULAR 12